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Single
crystal substrates (e.g., Si, GaAs)
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Expensive
processing facilities (Billion
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dollar
fabrication plants)
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Generally
invokes a series of process
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steps
in which a substrate is coated with a
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photoresist,
masked off, developed,
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etched,
vapor doped, and so on ad
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infinitum.
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There
are a very limited number of device
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architectures
which have been highly
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optimized
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Despite
the complexity silicon based
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devices
are good and arent going away
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anytime
soon.
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Conventional
devices configurations are
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applicable
to p-conjugated polymers
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